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Volumn 4, Issue 79, 2014, Pages 41922-41926

Conditioning of graphene surface by CO2cluster jet

(6) Choi, H a Kim, J A b Cho, Y c Hwang, T c Lee, J d Kim, T b,c

a SAMSUNG Electronics (South Korea)

b Sungkyunkwan University (South Korea)

c Sungkyunkwan University (South Korea)

d Zeus Co Ltd (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

GRAPHENE; SURFACE ROUGHNESS;

CHEMICAL DOPING; CLUSTER JETS; PLANARIZATION;

CARBON DIOXIDE;

EID: 84907152996 PISSN: None EISSN: 20462069 Source Type: Journal
DOI: 10.1039/c4ra05079g Document Type: Article

Times cited : (5)

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