Directed self-assembly of topcoat-free, integration-friendly high-χ block copolymers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 9425, Issue , 2015, Pages

  Hirahara, Eri ^d   Paunescu, Margareta ^d   Polishchuk, Orest ^d   Jeong, EunJeong ^d   Ng, Edward ^d   Shan, Jianhui ^d   Kim, Jihoon ^d   Hong, SungEun ^d   Baskaran, Durairaj ^d   Lin, Guanyang ^d   Vora, Ankit ^a   Tjio, Melia ^a   Arellano, Noel ^a   Rettner, Charles T ^a   Lofano, Elizabeth ^a   Liu, Chi Chun ^b   Tsai, Hsinyu ^c   Chunder, Anindarupa ^a   Nguyen, Khanh ^a   Friz, Alexander M ^a   Bowers, Amy N ^a   Balakrishnan, Srinivasan ^a   Cheng, Joy Y ^a   Sanders, Daniel P ^a   more..

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

^c IBM   (United States)

^d EMD Performance Materials Corp   (United States)

Author keywords

chemoepitaxy; directed self assembly; graphoepitaxy; organic high block copolymers; pattern development; perpendicular lamellae; topcoat free

Indexed keywords

COPOLYMERS; ESTERS; SELF ASSEMBLY; STYRENE;

CHEMOEPITAXY; DIRECTED SELF-ASSEMBLY; GRAPHOEPITAXY; PATTERN DEVELOPMENT; PERPENDICULAR LAMELLAE; TOPCOAT-FREE;

BLOCK COPOLYMERS;

EID: 84931477868     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.2087398     Document Type: Conference Paper

References (20)

1. Stoykovich, M. P. and Nealey, P. F., "Block copolymers and conventional lithography," Mater. Today 9(9), 20-29 (2006).
2. Black, C. T., Ruiz, R., Breyta, G., Cheng, J. Y., Colburn, M. E., Guarini, K. W., Kim, H.-C. and Zhang, Y., "Polymer self assembly in semiconductor microelectronics," IBM J. Res. & Dev. 51(5), 605-633 (2007).
3. Ren, Y., Lodge, T. P. and Hillmyer, M. A., "Synthesis, Characterization, and Interaction Strengths of Difluorocarbene-Modified Polystyrene-Polyisoprene Block Copolymers," Macromolecules 33(3), 866-876 (2000).
4. Kim, S., Nealey, P. F. and Bates, F. S., "Directed Assembly of Lamellae Forming Block Copolymer Thin Films near the Order-Disorder Transition," Nano Lett. 1(1), 11-14 (2012).
5. Son, J. G., Gotrik, K. W., Ross, C. A., "High-Aspect-Ratio Perpendicular Orientation of PS-b-PDMS Thin Films under Solvent Annealing," ACS Macro Lett., 1(11), 1279-1284 (2012).
6. Shamsudin, S. A. B., Sakaguchi, G., Takenaka, M. and Hasegawa, H., "Influence of Temperature and Type of Solvents on the Microdomain Orientation of PS-b-P2VP Ultrathin Films by Solvent Annealing," Macromol. Symp., 327(1), 72-29 (2013).
7. Cushen, J. D., Bates, C. M., Rausch, E. L., Dean, L. M., Zhou, S. X., Willson, C. G. and Ellison, C. J., "Thin Film Self-Assembly of Poly(trimethylsilylstyrene-b-D,L-lactide) with Sub-10 nm Domains," Macromolecules 45(21), 8722-8728 (2012).
8. Li, H., Gu, W., Zhang, Y., Russell, T. P. and Coughlin E. B., "Synthesis of Semicrystalline/Fluorinated Side-Chain Crystalline Block Copolymers and Their Bulk and Thin Film Nanoordering," Macromolecules 46(10), 3737-3745 (2013).
9. Yoshida, H., Suh, H.-S., Ramirez-Hernandez, A., Lee, J.-I., Aida, K., Wan, L., Ishida, Y., Tada, Y., Ruiz, R., De Pablo, J. and Nealey. P. F., "Topcoat Approaches for Directed Self-Assembly of Strongly Segregating Block Copolymer Thin Films," J. Photopolym. Sci. Technol. 26(1), 55-58 (2013).
10. Ji, S., Liu, C.-C., Son, J. G., Gotrik, K. W., Craig, G. S. W., Gopalan, P., Himpsel, F. J., Char, K. and Nealey, P. F., "Generation of the Use of Random Copolymers To Control the Wetting Behavior of Block Copolymer Films," Macromolecules, 41(23), 9098-9103 (2008).
11. Bates, C. M., Seshimo, T., Maher, M. J., Durand, W. J., Cushen, J. D., Dean, L. M., Blachut, G., Ellison, C. J. and C. G. Willson, "Polarity-Switching Top Coats Enable Orientation of Sub-10-nm Block Copolymer Domains," Science 338(6108), 775-779 (2012).
12. Maher, M. M., Bates, C. M., Blachut, G., Sirard, S., Self, J. L., Carlson, M. C., Dean, L. M., Cushen, J. D., Durand, W. J., Hayes, C. O., Ellison and C. J., Willson, C. G., "Interfacial Design for Block Copolymer Thin Films," Chem. Mater. 26(3), 1471-1479 (2014).
13. Zhang, J., Wu, J., Ginzburg, V. V., Weinhold, J. D., Clark, M. B., Trefonas, P. and Hustad, P. D., "New Materials for Directed Self-Assembly for Advanced Patterning," Proc. SPIE 9051, 905111-1-905111-10 (2014).
14. Vora, A., Chunder, A., Tjio, M., Balakrishnan, S., Lofano, E., Cheng, J. Y., Sanders, D. P., Hirahara, E., Akiyama, Y., Polishchuk, O., Paunescu, M., Hong, S., Baskaran, D. and Lin, G., "Organic High-χ Block Copolymers for Directed Self-Assembly," SPIE Poster Session #9051-85, Advances in Patterning/Materials and Processes XXXI, February 26, 2014.
15. Jung, Y. S. and Ross, C. A., "Orientation-Controlled Self-Assembled Nanolithography Using Polystyrene-Polydimethylsiloxane Block Copolymer," Nano Lett. 7(7), 2046-2050 (2007).
16. Maher, M. J., Rettner, C. T., Bates, C. M., Blachut, M. C., Carlson, M. C., Durand, W. J., Ellison, C. J., Sanders, D. P., Cheng, J. Y. and Willson, C. G., "Directed Self-Assembly of Silicon-Containing Block Copolymer Thin Films," ACS Appl. Mater. Interfaces 7(5), 3323-3328 (2015).
17. Liu, C.-C., Han, E., Onses, M. S., Thode, C. J., Ji, S., Gopalan, P. and Nealey, P. F., "Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats," Macromolecules 44(7), 1876-1885 (2011).
18. Delgadillo, P. A. R., Gronheid, R., Thode, C. J., Wu, H., Cao, Y., Lin, G., Somervell, M., Nafus K. and Nealey P. F., "Geometric Control of Chemically Nano-patterned Substrates for Feature Multiplication Using Directed Self-Assembly of Block Copolymers," J. Photopolym. Sci. Technol. 25(1), 77-81 (2012).
19. Delgadillo, P. A. R., Gronheid, R., Lin, G., Cao, Y., Romo, A., Somervell, M., Nafus K. and Nealey P. F., "Process sensitivities in exemplary chemo-epitaxy directed self-assembly integration," Proc. SPIE 8680, 86801H-1-86801H-7 (2013).
20. Patel, K., Wallow, T., Levinson, H. J. and Spanos, C. J., "Comparative Study of line Width Roughness (LWR) in Next-Generation Lithography (NGL) Processes," Proc. SPIE 7640, 76400T-1-76400T-13 (2010).