Geometric control of chemically nano-patterned substrates for feature multiplication using directed self-assembly of block copolymers

Journal of Photopolymer Science and Technology

Volumn 25, Issue 1, 2012, Pages 77-81

  Rincon Delgadilloa, Paulina A ^a,b   Gronheid, Roel ^b   Thode, Christopher J ^a   Wu, Hengpeng ^c   Cao, Yi ^c   Lin, Guanyang ^c   Somervell, Mark ^d   Nafus, Kathleen ^d   Nealey, Paul F ^a  

^a Wisconsin Electric Machines and Power Electronics Consortium   (United States)

^b IMEC   (Belgium)

^c AZ Electronic Materials   (United States)

^d TOKYO ELECTRON AMERICA INC   (United States)

Author keywords

Block copolymer; Chemo epitaxy; Directed self assembly

Indexed keywords

EID: 84864456909     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.25.77     Document Type: Article

References (11)

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