Process sensitivities in exemplary chemo-epitaxy directed self-assembly integration

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8680, Issue , 2013, Pages

  Rincon Delgadillo, Paulina A ^a,b,c   Gronheid, Roel ^c   Lin, Guanyang ^d   Cao, Yi ^d   Romo, Ainhoa ^e   Somervell, Mark ^f   Nafus, Kathleen ^f   Nealey, Paul F ^a  

^a UNIVERSITY OF CHICAGO   (United States)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c IMEC   (Belgium)

^d AZ Electronic Materials   (United States)

^e Tokyo Electron Europe Limited   (United Kingdom)

^f TOKYO ELECTRON AMERICA INC   (United States)

Author keywords

Chemo epitaxy; Defectivity; Directed self assembly

Indexed keywords

CHEMO-EPITAXY; DEFECTIVITY; DIRECTED SELF-ASSEMBLY; HIGH VOLUME MANUFACTURING; OPTIMIZED PROCESS; PROCESS PARAMETERS; RECENT RESEARCHES; SUBSTRATE PROPERTIES;

BLOCK COPOLYMERS; DEFECTS; EPITAXIAL GROWTH; SELF ASSEMBLY;

TECHNOLOGY;

EID: 84878411741     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.2011446     Document Type: Conference Paper

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