Effect of processing parameters on microstructure of MoS2 ultra-thin films synthesized by chemical vapor deposition method

AIP Advances

Volumn 5, Issue 6, 2015, Pages

  Song, Yang ^a   Peng, Yingzi ^a   You, Suping ^a   Sun, Kewei ^a   Chen, Ji ^a   Qian, Zhenghong ^a  

^a HANGZHOU DIANZI UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; MOLYBDENUM COMPOUNDS; MOLYBDENUM OXIDE; PHOTOLUMINESCENCE SPECTROSCOPY; THIN FILMS; ULTRATHIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION;

APPLIED VOLTAGES; CHEMICAL VAPOR DEPOSITION METHODS; HEATING TIME; MOLYBDENUM TRIOXIDE; OPTIMAL EXPERIMENTAL CONDITIONS; PROCESSING PARAMETERS; SOURCE MATERIAL; ULTRATHIN LAYERS;

DEPOSITION;

EID: 84931282057     PISSN: None     EISSN: 21583226     Source Type: Journal    
DOI: 10.1063/1.4922419     Document Type: Article

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