Self-regulated growth of LaVO3 thin films by hybrid molecular beam epitaxy

Applied Physics Letters

Volumn 106, Issue 23, 2015, Pages

  Zhang, Hai Tian ^a   Dedon, Liv R ^b,c   Martin, Lane W ^b,c   Engel Herbert, Roman ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b University of California Berkeley   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY DISPERSIVE SPECTROSCOPY; EPITAXIAL GROWTH; FILM GROWTH; FILMS; GROWTH (MATERIALS); HYBRID MATERIALS; MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; OXIDE FILMS; POSITIVE IONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THIN FILMS; X RAY SPECTROSCOPY;

BACKSCATTERING MEASUREMENT; ENERGY DISPERSIVE X RAY SPECTROSCOPY; FILM COMPOSITION; FILM STOICHIOMETRY; METAL ORGANIC PRECURSORS; PEROVSKITE TITANATES; PRECISE CONTROL; STOICHIOMETRIC GROWTH;

MOLECULAR OXYGEN;

EID: 84931262139     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4922213     Document Type: Article

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