Cheap and stable titanium source for use in oxide molecular beam epitaxy systems

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 4, 1996, Pages 2677-2679

  Theis, C D ^a   Schlom, D G ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030487052     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580185     Document Type: Article

References (14)

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2. D. G. Schlom and J. S. Harris Jr., in Molecular Beam Epitaxy: Applications to Key Materials, edited by R. F. C. Farrow (Noyes, Park Ridge, 1995), pp. 505-622.
3. J. N. Eckstein, I. Bozovic, and G. G. Virshup, MRS Bull. 19, 44 (1994).
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6. H. Nozoye, N. Nishimiya, and H. Sato, Appl. Phys. Lett. 54, 231 (1989).
7. Ti-Ball™ is a registered trademark of Varian Associates, Vacuum Products Division, Lexington, MA.
8. K. M. Welch, Capture Pumping Technology, An Introduction, 1st ed. (Pergamon, New York, 1991), pp. 210-212.
9. D. J. Harra and T. W. Snouse, J. Vac. Sci. Technol. 9, 552 (1971).
10. EPI, Chorus Corporation, St. Paul, MN.
11. E. S. Hellman and E. H. Hartford, Jr., J. Vac. Sci. Technol. B 12, 1778 (1994).
12. M. V. Kuznetsov, A. S. Nasarov, and G. F. Ivanovsky, J. Vac. Sci. Technol. 6, 34 (1969).
13. The Oxide Handbook, 2nd ed., edited by G. V. Samsonov (IFI Plenum, New York, 1982), p. 153.
14. When thermally cycling the Ti-Ball™, it is important to cool or heat slowly through the titanium α→β transition which occurs in pure titanium at ∼880 °C (Refs. 8 and 9). It is recommended that the Ti-Ball™ be kept above ∼200 W when not in use (Ref. 8). At this power the titanium sublimation rate is negligible, but the temperature remains above the transition point (Ref. 8). Rapid thermal cycling causes the surface to roughen and increases the net surface area. This increased surface area can result in a significant decrease in the titanium sublimation rate (Ref. 8).