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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 31, Issue 4, 2013, Pages

Growth window and effect of substrate symmetry in hybrid molecular beam epitaxy of a Mott insulating rare earth titanate

(5) Moetakef, Pouya a Zhang, Jack Y a Raghavan, Santosh a Kajdos, Adam P a Stemmer, Susanne a

a University of California (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLUX RATIO; GROWTH WINDOW; HIGH GROWTH TEMPERATURES; MAGNETIC CHARACTERISTIC; MBE GROWTH; RARE EARTH TITANATES; SINGLE DOMAINS; STOICHIOMETRIC FILMS;

EPITAXIAL GROWTH; MOLECULAR BEAM EPITAXY; THIN FILMS;

FILM GROWTH;

EID: 84880143774 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.4804180 Document Type: Article

Times cited : (56)

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