Silicon nanowire growth on Si and SiO2 substrates by rf magnetron sputtering in Ar/H2

Applied Physics Express

Volumn 8, Issue 6, 2015, Pages

  Yamada, Ikumi ^a   Hirano, Yutaro ^a,b   Nishimura, Kenkichi ^a,c   Takao, Yoshinori ^a,d   Eriguchi, Koji ^a   Ono, Kouichi ^a  

^a KYOTO UNIVERSITY   (Japan)

^b NIPPON STEEL CORPORATION   (Japan)

^c STMICROELECTRONICS   (Italy)

^d YOKOHAMA NATIONAL UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETRON SPUTTERING; NANOWIRES; SILICA; SILICON; SILICON OXIDES; SUBSTRATES;

AU LAYERS; HIGH TEMPERATURE TUBE FURNACE; LARGE DIAMETER; POLYCRYSTALLINE; RF-MAGNETRON SPUTTERING; SI (100) SUBSTRATE; SILICON NANOWIRES; THERMAL OXIDE LAYER;

NITROGEN COMPOUNDS;

EID: 84930703864     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.7567/APEX.8.066201     Document Type: Article

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