Growth of straight silicon nanowires on amorphous substrates with uniform diameter, length, orientation, and location using nanopatterned host-mediated catalyst

Nano Letters

Volumn 11, Issue 12, 2011, Pages 5247-5251

  Wang, Chao ^a   Murphy, Patrick F ^a   Yao, Nan ^b   McIlwrath, Kevin ^c   Chou, Stephen Y ^a  

^a Nanostructure Laboratory   (United States)

^b PRINCETON UNIVERSITY   (United States)

^c Hitachi High Technologies America   (United States)

Author keywords

amorphous substrate; growth; guided growth; host mediation; nanoimprint lithography; nanopatterned catalyst; Si nanowire

Indexed keywords

AMORPHOUS SUBSTRATE; HIGH DENSITY; HOST MEDIATION; METAL CATALYST; NANO PATTERN; NANO-IMPRINT; NON-UNIFORMITIES; PREFERRED ORIENTATIONS; PURE METALS; SI NANOWIRE; SILICON NANOWIRES; UNIFORM DIAMETER;

CATALYSTS; GROWTH (MATERIALS); NANOWIRES; SILICON; SILICON COMPOUNDS; SILICON OXIDES; SUBSTRATES;

AMORPHOUS SILICON;

EID: 83655192480     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl2026663     Document Type: Article

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