SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 534, Issue , 2013, Pages 90-99

Growth of crystalline silicon nanowires on nickel-coated silicon wafer beneath sputtered amorphous carbon

(6) Li, Feng Ji a Zhang, Sam a Kong, Jun Hua b Guo, Jun b Cao, Xue Bo b Li, Bo c

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

b NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

c CENTRAL IRON AND STEEL RESEARCH INSTITUTE (China)

Author keywords

Crystalline silicon; Nanowires; Nickel catalyst; Oxidation; Rapid thermal annealing; Solid liquid solid growth

Indexed keywords

AMORPHOUS CARBON LAYER; CONTROLLABLE DIAMETER; CRYSTALLINE SILICONS; NICKEL CATALYST; OXIDATION PROCESS; SCANNING ELECTRON MICROSCOPE; SOLID-LIQUID-SOLID GROWTHS; TRANSMISSION ELECTRON MICROSCOPE;

AMORPHOUS CARBON; AMORPHOUS SILICON; CATALYSTS; CRYSTALLINE MATERIALS; NANOWIRES; NICKEL; OXIDATION; OXIDATION RESISTANCE; PHOTOELECTRONS; RAMAN SPECTROSCOPY; RAPID THERMAL ANNEALING; SCANNING ELECTRON MICROSCOPY; SILICON; SILICON OXIDES; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON WAFERS;

EID: 84876666082 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2013.02.007 Document Type: Article

Times cited : (10)

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