-
1
-
-
0032498174
-
-
1998Sci.279.208M 10.1126/science.279.5348.208
-
A.M. Morales, C.M. Lieber, Science 279, 208 (1998)
-
(1998)
Science
, vol.279
, pp. 208
-
-
Morales, A.M.1
Lieber, C.M.2
-
2
-
-
0000257890
-
-
1998PhRvB.5816024W 10.1103/PhysRevB.58.R16024
-
N. Wang, Y.H. Tang, Y.F. Zhang, C.S. Lee, Phys. Rev. B 58, R16024 (1998)
-
(1998)
Phys. Rev. B
, vol.58
-
-
Wang, N.1
Tang, Y.H.2
Zhang, Y.F.3
Lee, C.S.4
-
3
-
-
0032494919
-
-
1998ApPhL.73.3396Z 10.1063/1.122778
-
H.Z. Zhang, D.P. Yu, Y. Ding, Z.G. Bai, Q.L. Hang, S.Q. Feng, Appl. Phys. Lett. 73, 3396 (1998)
-
(1998)
Appl. Phys. Lett.
, vol.73
, pp. 3396
-
-
Zhang, H.Z.1
Yu, D.P.2
Ding, Y.3
Bai, Z.G.4
Hang, Q.L.5
Feng, S.Q.6
-
4
-
-
0037912948
-
-
10.1116/1.589291
-
J. Westwater, D.P. Gosain, S. Tomita, S. Usui, H. Ruda, J. Vac. Sci. Technol. B 15, 554 (1997)
-
(1997)
J. Vac. Sci. Technol. B
, vol.15
, pp. 554
-
-
Westwater, J.1
Gosain, D.P.2
Tomita, S.3
Usui, S.4
Ruda, H.5
-
5
-
-
78049334735
-
-
2010ApPhA.101.497K 10.1007/s00339-010-5886-7
-
F. Kokai, K. Uchiyama, T. Shimazu, A. Koshio, Appl. Phys. A 101, 497 (2010)
-
(2010)
Appl. Phys. A
, vol.101
, pp. 497
-
-
Kokai, F.1
Uchiyama, K.2
Shimazu, T.3
Koshio, A.4
-
6
-
-
49749146011
-
-
2008ApPhL.93f3104Q 10.1063/1.2967875
-
Y. Qin, X.N. Zhang, K. Zheng, H. Li, X.D. Han, Z. Zhang, Appl. Phys. Lett. 93, 063104 (2008)
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 063104
-
-
Qin, Y.1
Zhang, X.N.2
Zheng, K.3
Li, H.4
Han, X.D.5
Zhang, Z.6
-
7
-
-
65249141053
-
-
2009NanoL.9.864K 10.1021/nl803752w
-
B.S. Kim, T.W. Koo, J.H. Lee, D.S. Kim, Y.C. Jung, S.W. Hwang, B.L. Choi, E.K. Lee, J.M. Kim, D. Whang, Nano Lett. 9, 864 (2009)
-
(2009)
Nano Lett.
, vol.9
, pp. 864
-
-
Kim, B.S.1
Koo, T.W.2
Lee, J.H.3
Kim, D.S.4
Jung, Y.C.5
Hwang, S.W.6
Choi, B.L.7
Lee, E.K.8
Kim, J.M.9
Whang, D.10
-
8
-
-
77952992923
-
-
2010Nanot.21y5601C 10.1088/0957-4484/21/25/255601
-
M. Cuscunà, A. Convertino, L. Mariucci, G. Fortunato, L. Felisari, G. Nicotra, C. Spinella, A. Pecora, F. Martelli, Nanotechnology 21, 255601 (2010)
-
(2010)
Nanotechnology
, vol.21
, pp. 255601
-
-
Cuscunà, M.1
Convertino, A.2
Mariucci, L.3
Fortunato, G.4
Felisari, L.5
Nicotra, G.6
Spinella, C.7
Pecora, A.8
Martelli, F.9
-
9
-
-
0037596493
-
-
2003ApPhA.77.69K 10.1007/s00339-003-2128-2
-
F. Kokai, K. Takahashi, D. Kasuya, A. Nakayama, Y. Koga, M. Yudasaka, S. Iijima, Appl. Phys. A 77, 69 (2003)
-
(2003)
Appl. Phys. A
, vol.77
, pp. 69
-
-
Kokai, F.1
Takahashi, K.2
Kasuya, D.3
Nakayama, A.4
Koga, Y.5
Yudasaka, M.6
Iijima, S.7
-
10
-
-
69549135243
-
-
2009ApPhA.97.55K 10.1007/s00339-009-5339-3
-
F. Kokai, T. Shimazu, K. Adachi, A. Koshio, Y. Takahashi, Appl. Phys. A 97, 55 (2009)
-
(2009)
Appl. Phys. A
, vol.97
, pp. 55
-
-
Kokai, F.1
Shimazu, T.2
Adachi, K.3
Koshio, A.4
Takahashi, Y.5
-
11
-
-
77957812718
-
-
V. Kumar (eds) Elsevier Oxford 10.1016/B978-008044528-1.50006-3
-
Z. Zhong, C. Yang, C.M. Lieber, in Nanosilicon, ed. by V. Kumar (Elsevier, Oxford, 2008), pp. 176-216
-
(2008)
Nanosilicon
, pp. 176-216
-
-
Zhong, Z.1
Yang, C.2
Lieber, C.M.3
-
12
-
-
70349256495
-
-
V. Kumar (eds) Elsevier Oxford 10.1016/B978-008044528-1.50008-7
-
K.W. Adu, H.R. Gutierrez, P.C. Eklund, in Nanosilicon, ed. by V. Kumar (Elsevier, Oxford, 2008), pp. 258-288
-
(2008)
Nanosilicon
, pp. 258-288
-
-
Adu, K.W.1
Gutierrez, H.R.2
Eklund, P.C.3
-
13
-
-
0000058837
-
-
1999ApPhA.69S.229K
-
F. Kokai, K. Takahashi, M. Yudasaka, S. Iijima, Appl. Phys. A 69, S229 (1999)
-
(1999)
Appl. Phys. A
, vol.69
-
-
Kokai, F.1
Takahashi, K.2
Yudasaka, M.3
Iijima, S.4
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