Nickel flux induced effects on structural and optical properties of NiO films fabricated by PA-MOCVD

Vacuum

Volumn 119, Issue , 2015, Pages 77-80

  Wang, Hui ^a   Zhao, Yang ^b   Li, Xinzhong ^a   Wu, Chao ^b   Dong, Xin ^b   Ma, Yan ^b   Zhang, Baolin ^b   Du, Guotong ^b,c  

^a HENAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b JILIN UNIVERSITY   (China)

^c DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Nickel flux; Nickel oxide; PA MOCVD; Structure properties

Indexed keywords

ENERGY GAP; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NICKEL; NICKEL OXIDE; OPTICAL PROPERTIES; ORGANIC CHEMICALS; ORGANOMETALLICS; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION;

C-AXIS-PREFERRED ORIENTATION; CRYSTAL QUALITIES; GROWTH PARAMETERS; METAL ORGANIC; PHOTO-ASSISTED; STRUCTURAL AND OPTICAL PROPERTIES; STRUCTURE PROPERTY; ULTRAVIOLET VISIBLE SPECTROPHOTOMETER;

OPTICAL FILMS;

EID: 84929334803     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2015.04.034     Document Type: Article

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