SCOPUS 정보 검색 플랫폼

Volumn 15, Issue 12, 1996, Pages 1081-1083

Preparation and characteristics of nickel oxide thin film by controlled growth with sequential surface chemical reactions

(4) Kumagai, H a Matsumoto, M b Toyoda, K a Obara, M b

a INST OF PHYS AND CHEMICAL RESEARCH (Japan)

b KEIO UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; ELLIPSOMETRY; FILM GROWTH; FILM PREPARATION; NICKEL COMPOUNDS; REFRACTIVE INDEX; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SUBSTRATES; THERMAL EFFECTS; THIN FILMS;

FILM GROWTH CONTROL; SEQUENTIAL SURFACE CHEMICAL REACTIONS;

AMORPHOUS FILMS;

EID: 0030170254 PISSN: 02618028 EISSN: None Source Type: Journal
DOI: 10.1007/BF00274914 Document Type: Article

Times cited : (143)

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