Effect of growth temperature on structure and optical characters of NiO films fabricated by PA-MOCVD

Vacuum

Volumn 86, Issue 12, 2012, Pages 2044-2047

  Wang, H ^a,b   Wu, Guoguang ^a   Cai, X P ^a   Zhao, Y ^a   Shi, Z F ^a   Wang, J ^a   Xia, X C ^c   Dong, X ^a   Zhang, B L ^a   Ma, Y ^a   Du, G T ^a,c  

^a JILIN UNIVERSITY   (China)

^b HENAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^c DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Growth temperature; MOCVD; NiO

Indexed keywords

CRYSTAL QUALITIES; CUBIC SHAPE; NIO; NIO FILMS; OPTICAL AND ELECTRICAL PROPERTIES; OPTICAL BANDS;

ELECTRIC PROPERTIES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SODIUM CHLORIDE; SUPERCONDUCTING FILMS;

GROWTH TEMPERATURE;

EID: 84863003028     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2012.05.006     Document Type: Article

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