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Volumn 644, Issue , 2015, Pages 101-105

Influence of the deposition temperature on the physical properties of high electron mobility ZnO films by sol-gel process

(2) Caglar, Mujdat a Ruzgar, Serif a

a ANADOLU UNIVERSITY (Turkey)

Author keywords

Deposition temperature; Hall effect; Sol gel; Space charge limited current mechanism (SCLC); ZnO film

Indexed keywords

CARRIER CONCENTRATION; CARRIER MOBILITY; CRYSTALLITE SIZE; DEPOSITION; ENAMELS; FIELD EMISSION MICROSCOPES; GRAIN BOUNDARIES; HALL EFFECT; METALLIC FILMS; OXIDE FILMS; SCANNING ELECTRON MICROSCOPY; ZINC OXIDE; ZINC SULFIDE;

DEPOSITION TEMPERATURES; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; HALL EFFECT MEASUREMENT; HEXAGONAL WURTZITE STRUCTURE; HIGH ELECTRON MOBILITY; SPACE CHARGE LIMITED CURRENTS; THREE ORDERS OF MAGNITUDE; ZNO FILMS;

SOL-GEL PROCESS;

EID: 84929072652 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2015.04.167 Document Type: Article

Times cited : (30)

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