The influence of titanium doping on the electric properties of amorphous alumina films prepared by sol–gel technology

Journal of Sol-Gel Science and Technology

Volumn 74, Issue 1, 2015, Pages 39-44

  Yao, Manwen ^a   Xiao, Ruihua ^a   Peng, Yong ^a   Chen, Jianwen ^a   Hu, Baofu ^a   Yao, Xi ^a  

^a TONGJI UNIVERSITY   (China)

Author keywords

Alumina film; Breakdown strength; Soft breakdown; Titanium doping

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ELECTRIC BREAKDOWN; FILM PREPARATION; OXIDE MINERALS; SOLS; TITANIUM; TITANIUM DIOXIDE; TITANIUM METALLOGRAPHY;

ALUMINA FILMS; AMORPHOUS ALUMINA; BREAKDOWN STRENGTHS; DIELECTRIC STRENGTHS; SOFT BREAKDOWN; TI-DOPED AL2O3; TITANIUM CATIONS; TITANIUM DOPING;

SEMICONDUCTOR DOPING;

EID: 84925488045     PISSN: 09280707     EISSN: 15734846     Source Type: Journal    
DOI: 10.1007/s10971-014-3568-1     Document Type: Article

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