An approach to increase efficiency of DOE based pupil shaping technique for off-axis illumination in optical lithography

Optics Express

Volumn 23, Issue 4, 2015, Pages 4484-4493

  Zhang, Fang ^a,b   Zhu, Jing ^a,b   Yue, Weirui ^a,b   Wang, Jian ^a,b   Song, Qiang ^a,b   Situ, Guohai ^a,b   Wyrowski, Frank ^c   Huang, Huijie ^a,b  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

^c FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FOURIER TRANSFORMS; LIGHT MODULATORS; PHOTOLITHOGRAPHY; POLES;

FOURIER TRANSFORMATIONS; ILLUMINATION SYSTEM; MACHINE MANUFACTURE; OFF AXIS ILLUMINATION; PROJECTION LITHOGRAPHY SYSTEMS; RESOLUTION ENHANCEMENT TECHNOLOGY; SHAPING TECHNIQUES; SPATIAL LIGHT MODULATORS;

ITERATIVE METHODS;

EID: 84924196823     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.23.004482     Document Type: Article

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