Advanced testing requirements of diffractive optical elements for off-axis illumination in photolithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7430, Issue , 2009, Pages

  Childers, John E ^a   Baker, Tom ^a   Emig, Tim ^a   Carriere, James ^a   Himel, Marc D ^a  

^a Tessera Inc   (United States)

Author keywords

Diffractive; Gauge; Off axis illumination; Test

Indexed keywords

DESIGN SPECIFICATION; DIFFRACTIVE; EXCIMERS; FAR FIELD; GAUGE; GAUGE CAPABILITY; IMMERSION LITHOGRAPHY; OFF-AXIS ILLUMINATION; OPTICAL TRANSMISSIONS; SOURCES OF VARIATION; STRINGENT REQUIREMENT; TEST; TEST STANDS; TESTING REQUIREMENTS;

GAGES; LASER BEAMS; LIGHT; LIGHT TRANSMISSION; OPTICAL TESTING; SPECIFICATIONS;

OPTICS;

EID: 70449424385     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.827395     Document Type: Conference Paper

References (0)