Mixed multi-region design of diffractive optical element for projection exposure system

Optik

Volumn 124, Issue 22, 2013, Pages 5573-5576

  Hu, Zhonghua ^a,b   Zhu, Jing ^a   Yang, Baoxi ^a,b   Xiao, Yanfen ^a   Zeng, Aijun ^a,b   Huang, Huijie ^a,b  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Diffractive optical element; Iterative Fourier transform; Lithography; Multi region design; Off axis illumination

Indexed keywords

FAR-FIELD INTENSITY DISTRIBUTION; ILLUMINATION UNIFORMITY; ITERATIVE FOURIER TRANSFORM; NON-UNIFORMITIES; OFF-AXIS ILLUMINATION; PROJECTION EXPOSURE; PROJECTION LITHOGRAPHY SYSTEMS; SPATIAL COHERENCE;

ALGORITHMS; DENSITY (OPTICAL); DESIGN; DIFFRACTION EFFICIENCY; EXCIMER LASERS; ITERATIVE METHODS; LITHOGRAPHY; PHOTOLITHOGRAPHY;

DIFFRACTIVE OPTICAL ELEMENTS;

EID: 84884592221     PISSN: 00304026     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijleo.2013.05.001     Document Type: Article

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