Improvements to optical performance in diffractive elements used for off-axis illumination

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7430, Issue , 2009, Pages

  Welch, Kevin ^a   Fedor, Adam ^a   Felder, Daniel ^a   Childers, John ^a   Emig, Tim ^a  

^a Tessera North America ^*  (United States)

Author keywords

Diffractive Optical Element; DOE; Off axis illumination; Pole Balance

Indexed keywords

CAPABILITY INDICES; DIFFRACTIVE ELEMENT; DOE; ILLUMINATION SYSTEM; IMAGING PERFORMANCE; LITHOGRAPHIC TOOLS; MANUFACTURING METHODOLOGY; MANUFACTURING PROCESS; OFF-AXIS; OFF-AXIS ILLUMINATION; OPTICAL PERFORMANCE; STRINGENT REQUIREMENT; TOOL-TO-TOOL MATCHING;

DENSITY (OPTICAL); DIFFRACTIVE OPTICAL ELEMENTS; INDUSTRIAL ENGINEERING; LASER BEAMS; PRODUCTION ENGINEERING;

POLES;

EID: 70449429582     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.827396     Document Type: Conference Paper

References (3)

1. Leonard, J., Carriere, J., Jones, R., Himel, M., Stack, J., Childers, J. and Welch, K., "An improved process for manufacturing diffractive optical elements (DOEs) for off-axis illumination systems," Proc. SPIE 6924-97 (2008).
2. Granik,Y., Schellenberg, F., Carriere, J. and Himel, M., "Manufacturable source mask optimization," in Microlithography World, Vol. 17 (4), November (2008).
3. Coskun, T., Sezginer, A., Kamat, V., Kruger, M., Yenikaya, B., Carriere, J., Stack, J. and Himel, M., "Enabling process window improvement at 45nm and 32nm with freeform DOE illumination," in Optical Microlithography XXII, Harry J. Levinson, Mircea V. Dusa, Editor, Proc. SPIE vol. 7274, (2009).