Implementation of pattern specific illumination pupil optimization on step & scan systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 3, 2004, Pages 1323-1333

  Engelen, André ^a   Socha, Robert ^b   Hendrickx, Eric ^c   Scheepers, Wieger ^a   Nowak, Frank ^a   Van Dam, Marco ^a   Liebchen, Armin ^b   Faas, Denis ^a  

^a ASML   (Netherlands)

^b ASML US Inc   (United States)

^c IMEC   (Belgium)

Author keywords

Contrast Enhancement Technique; Customized Illumination; Diffractive Optical Elements (DOE); Illumination pupil; Low k1; Process optimization

Indexed keywords

CONTRAST ENHANCEMENT TECHNIQUE; CUSTOMIZED ILLUMINATION; DIFFRACTIVE OPTICAL ELEMENTS (DOE); ILLUMINATION PUPIL; PROCESS OPTIMIZATION;

ABERRATIONS; DIFFRACTIVE OPTICS; ELECTROMAGNETIC WAVE DIFFRACTION; ERROR CORRECTION; IMAGE ENHANCEMENT; LASER BEAMS; LASER OPTICS; LIGHTING; OPTIMIZATION; RADIATION; SCANNING ELECTRON MICROSCOPY;

PHOTOLITHOGRAPHY;

EID: 3843116478     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.544240     Document Type: Conference Paper

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