Analytical approximations of the source intensity distributions

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 2, 2005, Pages

  Granik, Yuri ^a   Adam, Kostas ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

OPC; Optical lithography; Optical proximity correction; Resolution enhancement techniques; RET

Indexed keywords

OPC; OPTICAL PROXIMITY CORRECTION; RESOLUTION ENHANCEMENT TECHNIQUES; RET;

APPROXIMATION THEORY; COMPUTER SIMULATION; LIGHT AMPLIFIERS; OPTICAL MATERIALS; OPTICAL RESOLVING POWER; SCANNING;

PHOTOLITHOGRAPHY;

EID: 33644588303     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.632185     Document Type: Conference Paper

References (2)

1. C. Bodendorf, R. Schlief, R. Ziebold, "Impact of measured pupil illumination fill disctributio on lithography simulation and OPC models", Proc. SPIE, 5377, pp. 776-785, 2005.
2. T. Barrett, "Impact of illumination pupil-fill spatial variation on simulated image performance", Proc. SPIE, 4000, pp. 804-817, 2000.