Aerosol-assisted chemical vapor deposition of metal oxide thin films for photoelectrochemical water splitting

International Journal of Hydrogen Energy

Volumn 40, Issue 5, 2015, Pages 2115-2131

  Ariffin, S N ^a   Lim, H N ^a   Talib, Z A ^a   Pandikumar, A ^b   Huang, N M ^b  

^a UNIVERSITY PUTRA MALAYSIA   (Malaysia)

^b UNIVERSITY OF MALAYA   (Malaysia)

Author keywords

AACVD; Hydrogen production; Metal oxide; Photoelectrochemical cells; Thin film; Water splitting

Indexed keywords

AEROSOLS; CHEMICAL VAPOR DEPOSITION; ENTERTAINMENT INDUSTRY; METALLIC COMPOUNDS; METALS; OXIDE FILMS; PHOTOELECTROCHEMICAL CELLS; THIN FILMS;

AACVD; AEROSOL ASSISTED CHEMICAL VAPOR DEPOSITIONS (AACVD); AEROSOL-ASSISTED CHEMICAL VAPOR DEPOSITIONS; ALTERNATIVE ENERGY SOURCE; METAL OXIDES; PHOTOELECTROCHEMICAL WATER SPLITTING; PRODUCTION OF HYDROGEN; WATER SPLITTING;

HYDROGEN PRODUCTION;

EID: 84921270638     PISSN: 03603199     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijhydene.2014.11.131     Document Type: Review

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