Nanostructured ZnO thin films for optical, electrical, and photoelectrochemical applications from a new Zn complex

Industrial and Engineering Chemistry Research

Volumn 51, Issue 50, 2012, Pages 16361-16368

  Shahid, Muhammad ^a   Hamid, Mazhar ^a   Tahir, Asif A ^b   Mazhar, Muhammad ^c   Malik, Mohammad A ^d   Helliwell, Madeleine ^d  

^a QUAID I AZAM UNIVERSITY   (Pakistan)

^b UNIVERSITY OF LIVERPOOL   (United Kingdom)

^c UNIVERSITY OF MALAYA   (Malaysia)

^d UNIVERSITY OF MANCHESTER   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AEROSOL-ASSISTED CHEMICAL VAPOR DEPOSITIONS; CRYSTALLOGRAPHIC ORIENTATIONS; DECOMPOSITION TEMPERATURE; DEPOSITED FILMS; DEPOSITION TEMPERATURES; DIRECT BAND GAP; ENERGY DISPERSIVE X-RAY; HIGH SOLUBILITY; I-V MEASUREMENTS; MONOCLINIC SPACE GROUPS; NANO-STRUCTURED; OPTICAL CHARACTERIZATION; PHOTOELECTROCHEMICAL APPLICATIONS; PHOTOELECTROCHEMICALS; SINGLE CRYSTAL X-RAY ANALYSIS; SINGLE SOURCE; THERMAL GRAVIMETRIC ANALYSIS; ZINC COMPLEX; ZN COMPLEX; ZNO FILMS; ZNO THIN FILM;

ATMOSPHERIC IONIZATION; CHEMICAL VAPOR DEPOSITION; DEPOSITS; ELECTROCHEMISTRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MASS SPECTROMETRY; METALLIC FILMS; NANOSTRUCTURES; OPTICAL FILMS; ORGANIC SOLVENTS; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTALS; THERMOGRAVIMETRIC ANALYSIS; TOLUENE; X RAY DIFFRACTION;

ZINC;

EID: 84871304784     PISSN: 08885885     EISSN: 15205045     Source Type: Journal    
DOI: 10.1021/ie302398m     Document Type: Article

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