The influence of different electrodeposition E/t programs on the photoelectrochemical properties of α-Fe2O3 thin films

Thin Solid Films

Volumn 518, Issue 23, 2010, Pages 6844-6852

  Schrebler, Ricardo S ^a   Altamirano, Hernán ^a   Grez, Paula ^a   Herrera, Francisco V ^a   Muñoz, Eduardo C ^a   Ballesteros, Luis A ^a   Córdova, Ricardo A ^a   Gómez, Humberto ^a   Dalchiele, Enrique A ^b  

^a PONTIFICIA UNIVERSIDAD CATÓLICA DE VALPARAÍSO   (Chile)

^b INSTITUTO DE FÍSICA   (Uruguay)

Author keywords

Akaganeite; Electrodeposition; Hematite; Photoelectrochemistry

Indexed keywords

A-THERMAL; AKAGANEITE; ANODIC LIMITS; ELECTRODEPOSITION PROCESS; INCIDENT PHOTON-TO-CURRENT EFFICIENCIES; IRON OXYHYDROXIDES; MOTT-SCHOTTKY; NANOCRYSTALLINES; NANOSTRUCTURED MORPHOLOGY; ORDER OF MAGNITUDE; OXYGEN DEFECT; PARALLEL CAPACITANCE; PHOTO-ELECTROCHEMISTRY; PHOTOCURRENT TRANSIENTS; PHOTOELECTROCHEMICAL PROPERTIES; PHOTOVOLTAIC CONVERSION; POTENTIAL CYCLING; PRECURSOR FILMS; PULSED ELECTRODEPOSITION; RECOMBINATION PROCESS; SURFACE STATE; X-RAY DIFFRACTION MEASUREMENTS;

CAPACITANCE; CONVERSION EFFICIENCY; ELECTROCHEMISTRY; ELECTRODEPOSITION; FILM PREPARATION; HEMATITE; IRON ORES; IRON OXIDES; OXYGEN; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION;

OXIDE FILMS;

EID: 77956232049     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.06.065     Document Type: Article

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