Characterization of structured α-Fe2O3 photoanodes prepared via electrodeposition and thermal oxidation of iron

Thin Solid Films

Volumn 520, Issue 3, 2011, Pages 1034-1040

  Enache, C S ^a   Liang, Y Q ^a   Van De Krol, R ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Electrodeposition; Hematite; Photoanode; Photoelectrochemistry; Thermal oxidation

Indexed keywords

[110] DIRECTION; DEPOSITION CURRENT; DEPOSITION PARAMETERS; FE FILMS; FOUR-ORDER; HIGH CURRENT DENSITIES; LOW CURRENT DENSITY; NON-AQUEOUS; PHOTO-ANODES; PHOTO-ELECTROCHEMISTRY; PHOTO-ELECTRODES; PHOTOANODE; PHOTOCURRENT MEASUREMENT; PHOTOELECTROCHEMICAL PROPERTIES; POROUS FILM; PRECURSOR SOLUTIONS; PREFERRED ORIENTATIONS; ROOM TEMPERATURE; THERMAL OXIDATION; TRANSPARENT CONDUCTING GLASS; UNDERLAYERS; WATER SPLITTING;

ELECTROCHEMISTRY; ELECTRODEPOSITION; HEMATITE; IRON ORES; MORPHOLOGY; OXIDATION; SUBSTRATES; X RAY DIFFRACTION;

FILM PREPARATION;

EID: 81855202025     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.08.016     Document Type: Conference Paper

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