Visible light photocatalytic activity in AACVD-prepared n-modified TiO 2 thin films

Chemical Vapor Deposition

Volumn 20, Issue 1-3, 2014, Pages 91-97

  Diesen, Veronica ^b   Dunnill, Charles W ^a   Bear, Joseph C ^a   Firth, Steve ^a   Jonsson, Mats ^b   Parkin, Ivan P ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

^b ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

AACVD; Photocatalysis; Tris; Visible light

Indexed keywords

AMMONIA; ELECTRON DIFFRACTION; FORMALDEHYDE; FREE RADICALS; LIQUIDS; NITROGEN; PHOTOCATALYSIS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; THIN FILMS; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET VISIBLE SPECTROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

AACVD; N-MODIFIED TIO; PHOTOCHEMICAL QUANTUM YIELD; SELECTED AREA ELECTRON DIFFRACTION; TRIS; TRISHYDROXYMETHYLAMINOMETHANE; VISIBLE LIGHT; VISIBLE LIGHT PHOTOCATALYTIC ACTIVITY;

FILM PREPARATION;

EID: 84901688668     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.201307086     Document Type: Article

References (45)

1. S. K. Mohapatra, M. Misra, V. K. Mahajan, K. S. Raja, J. Phys. Chem. C 2007, 111, 8677-8685.
2. A. Wolcott, W. A. Smith, T. R. Kuykendall, Y. Zhao, J. Z. Zhang, Small 2009, 5, 104.
3. P. Hartmann, D.-K. Lee, B. M. Smarsly, J. Janek, ACS Nano 2010, 4, 3147.
4. D. O. Scanlon, C. W. Dunnill, J. Buckeridge, S. A. Shevlin, A. J. Logsdail, S. M. Woodley, C. R. A. Catlow, M. J. Powell, R. G. Palgrave, I. P. Parkin, G. W. Watson, T. W. Keal, P. Sherwood, A. Walsh, A. A. Sokol, Nat. Mater. 2013, 12, 798.
5. H. Choi, E. Stathatos, D. D. Dionysiou, Desalination 2007, 202, 199.
6. F. Han, V. S. R. Kambala, M. Srinivasan, D. Rajarathnam, R. Naidu, Appl. Catal. A 2009, 359, 25.
7. U. Bach, D. Lupo, P. Comte, J. Moser, F. Weissörtel, J. Salbeck, H. Spreitzer, M. Grätzel, Nature 1998, 395, 583.
8. S. Ito, S. M. Zakeeruddin, R. Humphry Baker, P. Liska, R. Charvet, P. Comte, M. K. Nazeeruddin, P. Péchy, M. Takata, H. Miura, Adv. Mater. 2006, 18, 1202.
9. J. L. Gole, J. D. Stout, C. Burda, Y. Lou, X. Chen, J. Phys. Chem. B 2004, 108, 1230.
10. M. Anpo, Pure Appl. Chem. 2000, 72, 1787.
11. A. Fuerte, M. Hernandez-Alonso, A. Maira, A. Martinez-Arias, M. Fernandez-Garcia, J. Conesa, J. Soria, Chem. Commun. 2001, 2718.
12. H. Yamashita, M. Harada, J. Misaka, M. Takeuchi, Y. Ichihashi, F. Goto, M. Ishida, T. Sasaki, M. Anpo, J. Synchrotron Radiation 2001, 8, 569.
13. A. Kafizas, C. W. Dunnill, I. P. Parkin, J. Mater. Chem. 2010, 20, 8336.
14. C. W. Dunnill, K. Page, Z. A. Aiken, S. Noimark, G. Hyett, A. Kafizas, J. Pratten, M. Wilson, I. P. Parkin, J. Photochem. Photobiol. A 2011, 220, 113.
15. M. Anpo, M. Takeuchi, J. Catal. 2003, 216, 505.
16. Y. Liu, X. Chen, J. Li, C. Burda, Chemosphere 2005, 61, 11.
17. T. Ohno, T. Mitsui, M. Matsumura, Chem. Lett. 2003, 364.
18. C. W. Dunnill, Z. A. Aiken, A. Kafizas, J. Pratten, M. Wilson, D. J. Morgan, I. P. Parkin, J. Mater. Chem. 2009, 19, 8747.
19. C. W. Dunnill, Z. Ansari, A. Kafizas, S. Perni, D. J. Morgan, M. Wilson, I. P. Parkin, J. Mater. Chem. 2011, 21, 11854-11861.
20. C. W. Dunnill, I. P. Parkin, Chem. Vap. Deposition 2009, 15, 171.
21. C. W. Dunnill, Z. A. Aiken, J. Pratten, M. Wilson, I. P. Parkin, Chem. Vap. Deposition 2010, 16, 50.
22. D. Chatterjee, A. Mahata, Appl. Catal. B 2001, 33, 119.
23. R. Asahi, T. Morikawa, T. Ohwaki, K. Aoki, Y. Taga, Science 2001, 293, 269.
24. C. W. Dunnill, I. P. Parkin, Dalton Trans. 2011, 40, 1635.
25. C. W. Dunnill, A. Kafizas, I. P. Parkin, Chem. Vap. Deposition 2012, 18, 89.
26. S. Sato, Chem. Phys. Lett. 1986, 123, 126.
27. T. Ihara, M. Miyoshi, Y. Iriyama, O. Matsumoto, S. Sugihara, Appl. Catal. B 2003, 42, 403.
28. H. Irie, Y. Watanabe, K. Hashimoto, J. Phys. Chem. B 2003, 107, 5483.
29. C. W. H. Dunnill, Z. A. Aiken, J. Pratten, M. Wilson, D. J. Morgan, I. P. Parkin, J. Photochem. Photobiol. A 2009, 207, 244.
30. C. R. Crick, J. C. Bear, A. Kafizas, I. P. Parkin, Adv. Mater. 2012, 24, 3505.
31. V. Diesen, M. Jonsson, J. Adv. Oxidation Technol. 2012, 15, 392.
32. Q. Li, P. Sritharathikhun, S. Motomizu, Anal. Sci. 2007, 23, 413.
33. G. Busca, J. Lamotte, J. C. Lavalley, V. Lorenzelli, J. Am. Chem. Soc. 1987, 109, 5197.
34. V. Diesen, M. Jonsson, J. Adv. Oxidation Technol. 2013, 16, 16.
35. V. Diesen, C. W. Dunnill, E. Osterberg, I. P. Parkin, M. Jonsson, Dalton Trans. 2014, 43, 344.
36. V. Diesen, M. Jonsson, I. P. Parkin, Chem. Vap. Deposition, in press.
37. R. Swanepoel, J. Phys. E: Sci. Instrum. 1983, 16, 1214.
38. M. R. Hoffmann, S. T. Martin, W. Choi, D. W. Bahnemann, Chem. Rev. 1995, 95, 69.
39. S. A. O'Neill, R. J. Clark, I. P. Parkin, N. Elliott, A. Mills, Chem. Mater. 2003, 15, 46.
40. G. Hyett, M. Green, I. P. Parkin, J. Am. Chem. Soc. 2006, 128, 12147.
41. J. Tauc, Mater. Res. Bull. 1968, 3, 37.
42. I. Sopyan, S. Murasawa, K. Hashimoto, A. Fujishima, Chem. Lett. 1994, 23, 723.
43. F. Amano, A. Yamakata, K. Nogami, M. Osawa, B. Ohtani, J. Am. Chem. Soc. 2008, 130, 17650.
44. E. Kowalska, R. Abe, B. Ohtani, Chem. Commun. 2009, 241.
45. J. Tang, Z. Zou, J. Yin, J. Ye, Chem. Phys. Lett. 2003, 382, 175.