Structural and XPS characterization of ALD Al2O3 coated porous silicon

Vacuum

Volumn 113, Issue , 2015, Pages 52-58

  Iatsunskyi, Igor ^a,b   Kempiński, Mateusz ^a   Jancelewicz, Mariusz ^a   Załęski, Karol ^a   Jurga, Stefan ^a   Smyntyna, Valentyn ^b  

^a ADAM MICKIEWICZ UNIVERSITY   (Poland)

^b ODESSA NATIONAL UNIVERSITY   (Ukraine)

Author keywords

Aluminum oxide; Atomic layer deposition; Porous silicon; XPS

Indexed keywords

ALUMINUM; ALUMINUM COATINGS; ATOMIC LAYER DEPOSITION; BINDING ENERGY; CHEMICAL ANALYSIS; CRYSTAL ATOMIC STRUCTURE; DEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; ENERGY GAP; POROUS SILICON; SCANNING ELECTRON MICROSCOPY; SILICON; X RAY SPECTROSCOPY;

ALUMINUM OXIDES; BINDING ENERGY ANALYSIS; ELEMENTAL COMPOSITIONS; ENERGY DISPERSIVE X RAY SPECTROSCOPY; MESOPOROUS STRUCTURES; METAL-ASSISTED CHEMICAL ETCHING; SILICON NANO STRUCTURES; XPS CHARACTERIZATION;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84920572927     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2014.12.015     Document Type: Article

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