Surface passivation of efficient nanotextured black silicon solar cells using thermal atomic layer deposition

ACS Applied Materials and Interfaces

Volumn 5, Issue 19, 2013, Pages 9752-9759

  Wang, Wei Cheng ^a   Lin, Che Wei ^a   Chen, Hsin Jui ^a   Chang, Che Wei ^a   Huang, Jhih Jie ^a   Yang, Ming Jui ^b   Tjahjono, Budi ^b   Huang, Jian Jia ^c   Hsu, Wen Ching ^c   Chen, Miin Jang ^a,d  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b Sunrise Global Solar Energy Co Ltd   (Taiwan)

^c Sino American Silicon Productions Inc   (Taiwan)

^d NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

Author keywords

atomic layer deposition; nanotextured black silicon; silicon nanowire; solar cell; surface passivation

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ATOMIC LAYER DEPOSITION; ATOMS; EFFICIENCY; NANOWIRES; SILICON SOLAR CELLS; SILICON WAFERS; SOLAR CELLS;

BLACK SILICON; BLACK SILICON SOLAR CELLS; BROADBAND ANTI REFLECTIONS; FIELD EFFECT PASSIVATION; FORMING GAS ANNEALING; SILICON NANOWIRES; SURFACE PASSIVATION; SURFACE RECOMBINATIONS;

PASSIVATION;

EID: 84885457201     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am402889k     Document Type: Article

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