Comparison of surface vacuum ultraviolet emissions with resonance level number densities. II. Rare-gas plasmas and Ar-molecular gas mixtures

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 33, Issue 2, 2015, Pages

  Boffard, John B ^a   Lin, Chun C ^a   Wang, Shicong ^a   Wendt, Amy E ^a   Culver, Cody ^a   Radovanov, Svetlana ^b   Persing, Harold ^b  

^a Wisconsin Electric Machines and Power Electronics Consortium   (United States)

^b Applied Materials Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EMISSION SPECTROSCOPY; FLUXES; GAS EMISSIONS; GAS MIXTURES; KRYPTON; MATERIALS PROPERTIES; MIXTURES; MOLECULES; NEON; OPTICAL EMISSION SPECTROSCOPY; RESONANCE; VACUUM APPLICATIONS; XENON;

ELECTRICAL CHARACTERISTIC; FLUORESCENCE DETECTION; PRINCIPAL RESONANCE; PURE-ARGON PLASMAS; RADIATION TRAPPING; SEMICONDUCTOR PROCESSING; SURFACE PROPERTIES OF MATERIALS; VACUUM ULTRAVIOLET EMISSION;

ARGON;

EID: 84919663676     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.4904036     Document Type: Article

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