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Acta Materialia

Volumn 85, Issue , 2015, Pages 122-131

Role of materials chemistry on the electrical/electronic properties of CuO thin films

(4) Shen, Yonglong a Guo, Meilan a,b Xia, Xiaohong a,b Shao, Guosheng a,c

a UNIVERSITY OF BOLTON (United Kingdom)

b HUBEI UNIVERSITY (China)

c ZHENGZHOU UNIVERSITY (China)

Author keywords

Alloy chemistry; Copper oxides; Current voltage characteristics; Hall measurement; Schottky junction

Indexed keywords

COPPER OXIDES; CURRENT VOLTAGE CHARACTERISTICS; ELECTRON ENERGY LEVELS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON SCATTERING; ENERGY DISPERSIVE X RAY ANALYSIS; ENERGY DISSIPATION; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MICROSTRUCTURE; PHOTONIC DEVICES; SCANNING ELECTRON MICROSCOPY; SCHOTTKY BARRIER DIODES; SEMICONDUCTOR DIODES; SOLAR ENERGY; SPUTTERING; THIN FILMS; X RAY DIFFRACTION;

ABUNDANT MATERIALS; ALLOY CHEMISTRY; HALL MEASUREMENTS; HIGH RESOLUTION; MATERIALS CHEMISTRY; RADIO FREQUENCY SPUTTERING; SCHOTTKY JUNCTIONS; SPUTTERING CONDITIONS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84918510560 PISSN: 13596454 EISSN: None Source Type: Journal
DOI: 10.1016/j.actamat.2014.11.018 Document Type: Article

Times cited : (93)

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