Structural, surface morphological, and optical properties of nanocrystalline Cu 2O and CuO films formed by RF magnetron sputtering: Oxygen partial pressure effect

Physica Status Solidi (A) Applications and Materials Science

Volumn 209, Issue 7, 2012, Pages 1279-1286

  Hari Prasad Reddy, M ^a   Pierson, J F ^b   Uthanna, S ^a  

^a SRI VENKATESWARA UNIVERSITY   (India)

^b INSTITUT JEAN LAMOUR   (France)

Author keywords

copper oxide thin films; optical properties; RF magnetron sputtering; XPS

Indexed keywords

ATOMIC FORCE MICROGRAPHS; CHEMICAL BINDING; COPPER OXIDE THIN FILMS; COPPER TARGET; DEPOSITED FILMS; ELECTRICAL RESISTIVITY; GRAIN SIZE; INFLUENCE OF OXYGEN; LOW OXYGEN PARTIAL PRESSURE; MIXED PHASE; NANOCRYSTALLINE CU; OXYGEN PARTIAL PRESSURE; RADIO FREQUENCY MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; SILICON SUBSTRATES;

BINDING ENERGY; ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; OPTICAL BAND GAPS; OPTICAL PROPERTIES; OXIDE FILMS; PARTIAL PRESSURE; POSITIVE IONS; PRESSURE EFFECTS; X RAY PHOTOELECTRON SPECTROSCOPY;

COPPER;

EID: 84863706599     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.201127627     Document Type: Article

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