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Volumn 32, Issue 5, 2014, Pages

Roll-to-roll atomic layer deposition process for flexible electronics encapsulation applications

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FILM GROWTH; FLEXIBLE DISPLAYS; FLEXIBLE ELECTRONICS; LIGHT EMITTING DIODES; OPTICAL DATA PROCESSING; SUBSTRATES;

EID: 84913577765     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.4893428     Document Type: Article
Times cited : (55)

References (19)
  • 2
    • 0034274073 scopus 로고    scopus 로고
    • 10.1002/1521-4095(200009)12:17<1249::AID-ADMA1249>3.0.CO;2-Y
    • D. A. Pardo, G. E. Jabbour, and N. Peyghambarian, Adv. Mater. 12, 1249 (2000). 10.1002/1521-4095(200009)12:17<1249::AID-ADMA1249>3.0.CO;2-Y
    • (2000) Adv. Mater. , vol.12 , pp. 1249
    • Pardo, D.A.1    Jabbour, G.E.2    Peyghambarian, N.3
  • 4
    • 0037206626 scopus 로고    scopus 로고
    • Characterization of silicon oxynitride gas barrier films
    • DOI 10.1016/S0042-207X(02)00294-4, PII S0042207X02002944
    • S. Iwamori, Y. Gotoh, and K. Moorthi, Vacuum 68, 113 (2002). 10.1016/S0042-207X(02)00294-4 (Pubitemid 35167587)
    • (2002) Vacuum , vol.68 , Issue.2 , pp. 113-117
    • Iwamori, S.1    Gotoh, Y.2    Moorthi, K.3
  • 6
  • 13
    • 84940250312 scopus 로고    scopus 로고
    • 52th Annual Technical Conference Proceedings of the Society of Vacuum Coaters
    • E. R. Dickey and W. A. Barrow, 52th Annual Technical Conference Proceedings of the Society of Vacuum Coaters (2009), pp. 700-726.
    • (2009)
    • Dickey, E.R.1    Barrow, W.A.2
  • 17
    • 28044471578 scopus 로고    scopus 로고
    • Nucleation and growth during Al2O3 atomic layer deposition on polymers
    • DOI 10.1021/cm050704d
    • C. A. Wilson, R. K. Grubbs, and S. M. George, Chem. Mater. 17, 5625 (2005). 10.1021/cm050704d (Pubitemid 41692215)
    • (2005) Chemistry of Materials , vol.17 , Issue.23 , pp. 5625-5634
    • Wilson, C.A.1    Grubbs, R.K.2    George, S.M.3
  • 19
    • 0036685058 scopus 로고    scopus 로고
    • Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition
    • DOI 10.1063/1.1490410
    • J. W. Elam, M. D. Groner, and S. M. George, Rev. Sci. Instrum. 73, 2981 (2002). 10.1063/1.1490410 (Pubitemid 34946326)
    • (2002) Review of Scientific Instruments , vol.73 , Issue.8 , pp. 2981
    • Elam, J.W.1    Groner, M.D.2    George, S.M.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.