Deep-nanoscale pattern engineering by immersion-induced self-assembly

ACS Nano

Volumn 8, Issue 10, 2014, Pages 10009-10018

  Park, Woon Ik ^a,b   Kim, Jong Min ^a   Jeong, Jae Won ^a   Jung, Yeon Sik ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b RandD Center for Hybrid Interface Materials (HIM)   (South Korea)

Author keywords

immersion; lithography; polymer; self assembly; sub 15 nm

Indexed keywords

BLOCK COPOLYMERS; COST EFFECTIVENESS; LITHOGRAPHY; PHOTOLITHOGRAPHY; POLYMERS; SELF ASSEMBLY;

DIRECTED SELF-ASSEMBLY; FLORY-HUGGINS INTERACTION PARAMETER; IMMERSION; NANO-SCALE PATTERNS; REVERSIBLE FORMATION; SELF ASSEMBLY ROUTES; SOLVENT-VAPOR ANNEALING; SUB-15 NM;

NANOTECHNOLOGY;

EID: 84908432407     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn504995c     Document Type: Article

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