메뉴 건너뛰기




Volumn 6, Issue 21, 2014, Pages 12376-12382

Etching-free patterning method for electrical characterization of atomically thin MoSe2 films grown by chemical vapor deposition

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON BEAM LITHOGRAPHY; ETCHING; FIELD EFFECT TRANSISTORS;

EID: 84907993271     PISSN: 20403364     EISSN: 20403372     Source Type: Journal    
DOI: 10.1039/c4nr03817g     Document Type: Article
Times cited : (29)

References (41)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.