Fabrication of submicrometre buried gold-palladium wires on MoS2 using electron beam lithography

Nanotechnology

Volumn 7, Issue 2, 1996, Pages 144-152

  Rousset, V ^a   Itoua, S ^a   Joachim, C ^a   Tsobnang, F ^b   Rousset, B ^c   Pham, H H ^c  

^a CEMES CNRS   (France)

^b NOKIA RESEARCH CENTER   (United States)

^c LAAS CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; GOLD ALLOYS; MOLYBDENUM COMPOUNDS; NANOTECHNOLOGY; REACTIVE ION ETCHING; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACES;

COPLANAR BURIED METAL-METAL JUNCTION; ELECTRODE SEPARATION; LIFT OFF TECHNIQUE;

SEMICONDUCTOR JUNCTIONS;

EID: 0030165329     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/7/2/008     Document Type: Article

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