Rapid low-temperature processing of metal-oxide thin film transistors with combined far ultraviolet and thermal annealing

Applied Physics Letters

Volumn 105, Issue 11, 2014, Pages

  Leppaniemi J ^a   Ojanpera K ^a   Kololuoma, T ^a   Huttunen, O H ^a   Dahl, J ^b   Tuominen, M ^b   Laukkanen, P ^b   Majumdar, H ^a   Alastalo, A ^a  

^a VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

^b UNIVERSITY OF TURKU   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

FAR ULTRAVIOLET; LOW TEMPERATURE PROCESSING; METAL OXIDE THIN FILMS; THERMAL-ANNEALING;

EID: 84907546752     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4895830     Document Type: Article

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