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Volumn 21, Issue 4, 2011, Pages 1102-1108
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High-performance low-temperature solution-processable ZnO thin film transistors by microwave-assisted annealing
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Author keywords
[No Author keywords available]
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Indexed keywords
AIR STABILITY;
AMMONIUM HYDROXIDE SOLUTION;
DEHYDROXYLATIONS;
DEVICE CHARACTERISTICS;
HIGH PERFORMANCE APPLICATIONS;
INORGANIC PRECURSOR;
LOW TEMPERATURES;
MICROWAVE-ASSISTED;
ON/OFF CURRENT RATIO;
ORGANIC SEMICONDUCTOR;
OXIDE SEMICONDUCTOR;
PROCESSABLE;
SEMICONDUCTING LAYER;
SOLUTION-PROCESSED;
TRANSPARENT THIN FILM TRANSISTOR;
ZINC HYDROXIDE;
ZNO;
AMMONIUM COMPOUNDS;
AMORPHOUS FILMS;
AMORPHOUS SILICON;
DISSOLUTION;
IRRADIATION;
MICROWAVE IRRADIATION;
SPECTROSCOPIC ANALYSIS;
THIN FILM TRANSISTORS;
THIN FILMS;
ZINC OXIDE;
SEMICONDUCTING SILICON COMPOUNDS;
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EID: 78651401697
PISSN: 09599428
EISSN: 13645501
Source Type: Journal
DOI: 10.1039/c0jm02178d Document Type: Article |
Times cited : (163)
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References (22)
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