Structural analysis of textured silicon surfaces after ion implantation under tilted angle

Semiconductor Science and Technology

Volumn 29, Issue 9, 2014, Pages

  Krügener, Jan ^a   Bugiel, Eberhard ^a   Peibst, Robby ^b   Kiefer, Fabian ^b   Ohrdes, Tobias ^b   Brendel, Rolf ^a,b   Jorg Osten H ^a  

^a LEIBNIZ UNIVERSITY HANNOVER   (Germany)

^b INSTITUTE FOR SOLAR ENERGY RESEARCH HAMELIN ISFH   (Germany)

Author keywords

ion implantation; silicon; solar cells; textured surface

Indexed keywords

BORON; CRYSTAL DEFECTS; SILICON; SOLAR CELLS;

DEFECT DISTRIBUTION; LOCAL DOPING; SILICON SURFACES; STRUCTURAL INVESTIGATION; TEXTURED SI; TEXTURED SURFACE; TILT ANGLE; TILTED ANGLE;

ION IMPLANTATION;

EID: 84906546291     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/29/9/095004     Document Type: Article

References (22)

1. Bothe K, Sinton R and Schmidt J 2005 Prog. Photovolt., Res. Appl. 13 287-96
2. Ho W S, Huang Y-H, Hsu W-W, Chen Y-Y, Chen Y-Y and Liu C W 2011 37th IEEE Photovoltaic Specialists Conf. (PVSC) 1058
3. Böschke T S et al 2014 IEEE J. Photovoltaics 4 48-51
4. Florakis A, Janssens T, Rosseel E, Douhard B, Delmotte J, Cornagliotti E, Poortmans J and Vandervorst W 2012 Energy Procedia 27 240-6
5. Claverie A, Colombeau B, de Mauduit B, Bonafos C, Hebras X, ben Assayag G and Cristiano F 2003 Appl. Phys. A 76 1025-33
6. Milosavlijevic M, Shao G, Lourenco M A, Gwilliam R M and Homewood K P 2005 J. Appl. Phys. 97 073512 (Pubitemid 40537937)
7. Jones K S, Prussin S and Weber E R 1988 Appl. Phys. A 45 1-34
8. Seibt M, Khalil R, Kveder V and Schröter W 2009 Appl. Phys. A 96 235-53
9. Kveder V, Kittler M and Schröter W 2001 Phys. Rev. B 63 115208
10. Pan G Z, Tu K N and Prussin A 1997 J. Appl. Phys. 81 78-84
11. Ryssel H and Ruge I 1986 Ion Implantation (Chichester: Wiley)
12. Vallet M, Barbot J F, Declémy A, Reboh S and Beaufort M F 2013 J. Appl. Phys. 114 193501
13. King D L and Buck M E 1991 Proc. of the 22nd IEEE Photovoltaic Specialists Conf. (PVSC) 303
14. Kern W and Puotinen D A 1970 RCA Rev. 31 187-206
15. Ziegler J F, Biersack J P and Littmark U 1985 The Stopping and Range of Ions in Solids (New York: Pergamon)
16. Müller R, Benick J, Bateman N, Schön J, Reichel C, Richter A, Hermle M and Glunz S W 2014 Sol. Energy Mater. Sol. Cells 120 431-5
17. http://www.synopsys.com/Tools/TCAD/ProcessSimulation/Pages/ SentaurusProcess.aspx - ref-separator -
18. Williams D B and Carter C B 2009 Transmission Electron Microscopy - Part 3: Imaging 2nd edn (Berlin: Springer)
19. Liu J 1996 Defect and diffusion study in boron implanted silicon PhD Thesis Department of Materials Science and Engineering University of Florida
20. Agarwal A, Haynes T E, Eaglesham D J, Gossmann H-J, Jacobson D C, Poate J M and Erokhin Y E 1997 Appl. Phys. Lett. 70 3332-4
21. Cristiano F, Grisolia J, Colombeau B, Omri M, de Mauduit B, Claverie A, Giles L F and Cowern N E B 2000 J. Appl. Phys. 87 8420-8
22. Krügener J, Wolf F A, Peibst R, Kiefer F, Schöllhorn C, Grohe A, Brendel R and Osten H J 2013 Proc. of the 23rd Int. Photovoltaic Science and Engineering Conf. (PVSEC-23) (Taipei, Taiwan)