Influence of thermal annealing on microstructural, morphological, optical properties and surface electronic structure of copper oxide thin films

Materials Chemistry and Physics

Volumn 147, Issue 3, 2014, Pages 987-995

  Akgul, Funda Aksoy ^a,c   Akgul, Guvenc ^a,c   Yildirim, Nurcan ^b,c   Unalan, Husnu Emrah ^c   Turan, Rasit ^c  

^a NIGDE UNIVERSITY   (Turkey)

^b ANKARA UNIVERSITY   (Turkey)

^c MIDDLE EAST TECHNICAL UNIVERSITY   (Turkey)

Author keywords

A. Thin films; B. Sol gel growth; C. X ray photo emission spectroscopy (XPS); D. Electronic structure

Indexed keywords

ANNEALING; ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; ELECTRONIC STRUCTURE; FIELD EMISSION MICROSCOPES; OPTICAL PROPERTIES; OPTOELECTRONIC DEVICES; PHOTOELECTRON SPECTROSCOPY; SOL-GELS; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ANNEALING TEMPERATURES; COPPER OXIDE THIN FILMS; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; RELATIVE CONCENTRATION; SOL-GEL GROWTH; SURFACE ELECTRONIC STRUCTURES; THICKNESS OF THE FILM; XRAY PHOTO-EMISSION SPECTROSCOPY (XPS);

DEPOSITION;

EID: 84905678864     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2014.06.047     Document Type: Article

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