Preparation and characterization of copper oxide thin films deposited by filtered cathodic vacuum arc

Journal of Physics D: Applied Physics

Volumn 37, Issue 1, 2004, Pages 81-85

  Gan, Z H ^a   Yu, G Q ^a   Tay, B K ^a   Tan, C M ^a   Zhao, Z W ^a   Fu, Y Q ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COPPER OXIDES; DEPOSITION; ELECTRIC ARCS; FILM PREPARATION; MORPHOLOGY; RAMAN SPECTROSCOPY; SURFACES; TEXTURES; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CATHODIC VACUUM ARC; CRYSTALLINE PHASES;

THIN FILMS;

EID: 0347930303     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/37/1/013     Document Type: Article

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