Annealing effects on the properties of copper oxide thin films prepared by chemical deposition

International Journal of Electrochemical Science

Volumn 6, Issue 12, 2011, Pages 6094-6104

  Johan, Mohd Rafie ^a   Suan, Mohd Shahadan Mohd ^a   Hawari, Nor Liza ^a   Ching, Hee Ay ^a  

^a UNIVERSITY OF MALAYA   (Malaysia)

Author keywords

Annealing; Deposition; Optical property; Thin film

Indexed keywords

EID: 84855288988     PISSN: None     EISSN: 14523981     Source Type: Journal    
DOI: None     Document Type: Article

References (17)

1. G. Papadimitropoulos, N. Vourdas, V. Vamvakas Em and D. Davazoglou, Thin Solid Films, 515 (2006) 2428-2432.
2. K. H. Yoon, W. J. Choi and D.H. Kang, Thin Solid Films, 372 (2000) 250.
3. A.Y. Oral, E. Mensur, M. H. Aslan and E. Basaran, Mater. Chem. Phys., 83 (2004) 140.
4. C. R. Sekhar, Solar Energy Mater., 68 (2001) 307.
5. A.N. Banerjee and K. Chattopadhyay, Progress in Crystal Growth and Characterization of Material. 2005; 50 (2005) 52-105.
6. T. J. Richardson and M.D. Rubin, Electrochim. Acta, 46 (2001) 2381.
7. T. J. Richardson, Solid State Ionics, 165 (2003) 305.
8. N. D. Hoa, S. Y. An, N. Q. Dung, N. V. Quy and D. Kim D. Sensors and Actuators B: Chemical, 146 (2010) 239-244.
9. M. Ristov, G. I. Sinadinovski, and I. Grozdanov, Thin Solid Films, 123 (1985) 63.
10. M. T. S. Nair, L. Guerrero, O. L. Arenas, and P. K. Nair, Appl. Surf. Sci., 150 (1999) 143.
11. Y. F. Nicolau, Appl. Surf. Sci., 22-23 (1985) 1061.
12. D. G. Schlom, L. Q. Chen, X. Pan, A. Schmehl and M. A. A. Zurbuchen, J. Am. Ceram. Soc., 91 (2008) 2429-2454.
13. R. Al-Gaashani, S. Radiman, N. Tabet and A. R. Daud, J. Alloys and Compounds, 35 (2011) 8761-8769.
14. Z. Huda, and B. Ralph, Materials Characterization, 25 (1990) 211.
15. M. Al-Kuhaili, Vacuum, 82 (2008) 623-629.
16. B. Balamurugan, B.R. Mehta, D.K. Avasthi, F. Singh, A.K. Arora and M. Rajalakshmi, J Appl Phys., 92 (2002) 3304.
17. K. Draou, N. Bellakhal, B. G. Cheron and J. L. Brisset, Mater. Chem. Phys., 58 (1998) 212.