Optical system for a multiple-beam scanning electron microscope

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 32, Issue 5, 2014, Pages

  Enyama, Momoyo ^a   Sakakibara, Makoto ^a   Tanimoto, Sayaka ^a   Ohta, Hiroya ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELDS; ELECTRON BEAMS; SCANNING ELECTRON MICROSCOPY; SECONDARY EMISSION; ANGULAR DISTRIBUTION; CROSSTALK; ELECTRONS;

ENERGY SPREADS; HIGH SPEED IMAGING; MULTIPLE BEAM; SECONDARY ELECTRONS; SEM IMAGE; PRIMARY BEAMS; SECONDARY ELECTRON DETECTION;

OPTICAL SYSTEMS;

EID: 84905454979     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4891961     Document Type: Article

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