Scanning exposures with a MAPPER multibeam system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7970, Issue , 2011, Pages

  Van Den Berg, C ^a   De Boer, G ^a   Boschker, S ^a   Hakkennes, E A ^b   Holgate, G ^a   Hoving, M ^b   Jager, R ^a   Koning, J J ^a   Kuiper, V ^a   Ma, Yue ^a   Van Mil, I L ^a   Mook, H W ^a   Ooms, T ^a   Van De Peut, T ^a   Postma, S ^c   Sanderse, M ^a   Scheffers, P ^a   Slot, E ^a   Tudorie, A ^a   Valkering, A M C ^a   Venema, N ^a   Vergeer, N ^a   Wiersma, A ^b   Woutersen, S ^b   Wieland, M J ^a   Kampherbeek, B J ^a   more..

^a MAPPER Lithography BV   (Netherlands)

^b Recore Systems BV   (Netherlands)

^c DEMCON Advanced Mechatronics   (Netherlands)

Author keywords

Beam; Electron; Exposure; Lithography; MAPPER; Multi; Scanning; Stitching

Indexed keywords

BEAM; EXPOSURE; MAPPER; MULTI; STITCHING;

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON OPTICS; ELECTRONS; EQUIPMENT; INTERFEROMETERS; SCANNING; STABILITY;

CONTROL SYSTEM STABILITY;

EID: 79955882193     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.881572     Document Type: Conference Paper

References (6)

1. E. Slot et al., "MAPPER: HIGH THROUGHPUT MASKLESS LITHOGRAPHY, "Proc. of SPIE Vol. 6921, 69211P, (2008)
2. M.J. Wieland et al., "MAPPER: High throughput maskless lithography", Proc. of SPIE Vol. 7271, 72710O1, (2009)
3. M.J. Wieland et al, "MAPPER: High throughput maskless lithography", Proc. SPIE, Vol. 7637, 76370F (2010)
4. M.J. Wieland et al, "Throughput enhancement technique for MAPPER maskless lithography", Proc. of SPIE, Vol. 7637, 76371Z (2010)
5. L. Pain et al, 'IMAGINE: an open consortium to boost maskless lithography take off First assessment results on MAPPER technology', Proc. SPIE, Vol. 7970, (2011)
6. M.J. Wieland et al, "Demonstration of Real Time pattern correction for high throughput maskless lithography", Proc. SPIE 2011, to be published