Source-mask co-optimization: Optimize design for imaging and impact of source complexity on lithography performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7520, Issue , 2009, Pages

  Hsu, Stephen ^a   Li, Zhipan ^a   Chen, Luoqi ^a   Gronlund, Keith ^a   Liu, Hua Yu ^a   Socha, Robert ^b  

^a Brion Technologies Inc   (United States)

^b ASML US Inc   (United States)

Author keywords

Co optimization; Continuous transmission mask (CTM); Cost function; Diffractive optical element (DOE); Edge placement error (EPE); Freeform DOE; Image log slope (ILS); Library DOE; Low k1; Mask; Parametric DOE

Indexed keywords

CO-OPTIMIZATION; CONTINUOUS TRANSMISSION MASK (CTM); EDGE PLACEMENT ERROR (EPE); EDGE PLACEMENT ERRORS; FREEFORMS; IMAGE LOG SLOPE (ILS);

CAPACITANCE; COST FUNCTIONS; COSTS; DENSITY (OPTICAL); DIFFRACTIVE OPTICAL ELEMENTS; FUZZY CONTROL; LIGHT TRANSMISSION; LOGIC DESIGN; MASKS; PHOTOLITHOGRAPHY; SCANNING; SEED;

OPTIMIZATION;

EID: 77952069639     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.838701     Document Type: Conference Paper

References (6)

1. Alan E. Rosenbluth, et al. Optimum mask and source patterns to print a given shape. SPIE Vol. 4346, 2001, pp 486-502.
2. Alan E. Rosenbluth et al. Intensive optimization of masks and sources for 22nm lithography SPIE Vol. 7274, 727409 (2009)
3. Stephen D. Hsu et al. An innovative Source-Mask co-Optimization (SMO) method for extending low k1 imaging SPIE Vol. 7140.
4. Robert Socha et al. Simultaneous source mask optimization (SMO). SPIE Vol. 5853, 2005, pp 180-193
5. Andreas Antoniou, Wu-Sheng Lu. Practical Optimization: Algorithms and Engineering Applications, Springer, 2007
6. M. Eurling et al. Experimental verification of a model based decomposition method for Double Dipole Lithography. SPIE Vol. 5377, 2004