Deposition and characterization of titanium carbide thin films by magnetron sputtering using Ti and TiC targets

Applied Surface Science

Volumn 312, Issue , 2014, Pages 57-62

  Ait Djafer, Amina Zouina ^a,b   Saoula, Nadia ^a   Madaoui, Noureddine ^a   Zerizer, Abdellatif ^b  

^a CENTRE DE DÉVELOPPEMENT DES TECHNOLOGIES AVANCÉES   (Algeria)

^b Laboratoire des Matériaux Minéraux et Composites   (Algeria)

Author keywords

Hard coatings; Hardness; Magnetron sputtering; Thin films; TiC

Indexed keywords

HARD COATINGS; HARDNESS; MAGNETRON SPUTTERING; RAMAN SPECTROSCOPY; SUBSTRATES; TITANIUM CARBIDE;

DEPOSITED LAYER; FILM DEPOSITION; FOUR-PROBE TECHNIQUES; PURE TITANIUMS; RF-MAGNETRON SPUTTERING; STEEL SUBSTRATE; SUBSTRATE BIAS; TITANIUM CARBIDE THIN FILMS;

THIN FILMS;

EID: 84904735077     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2014.05.084     Document Type: Conference Paper

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