Mechanical and structural properties of TiC and TiCN thin films grown by RF sputtering

Materials Research Society Symposium - Proceedings

Volumn 778, Issue , 2003, Pages 201-206

  Mani, A ^a   Aubert, P ^a   Khodja, H ^b   Houdy, P ^a  

^a UNIVERSITÉ D EVRY VAL D ESSONNE   (France)

^b DIF   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; COMPRESSIVE STRESS; CRYSTAL STRUCTURE; FILM GROWTH; HARDNESS; PARTIAL PRESSURE; PRESSURE EFFECTS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTERING; STOICHIOMETRY; TITANIUM CARBIDE; TITANIUM NITRIDE;

PRESSURE GAS SPUTTERING; TITANIUM CARBONITRIDE;

THIN FILMS;

EID: 0347655325     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-778-u6.13     Document Type: Conference Paper

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