Microstructure and composition of TiC/a-C:H nanocomposite thin films deposited by a hybrid IPVD/PECVD process

Surface and Coatings Technology

Volumn 204, Issue 12-13, 2010, Pages 1880-1883

  El Mel, A A ^a   Angleraud, B ^a   Gautron, E ^a   Granier, A ^a   Tessier, P Y ^a  

^a UNIVERSITÉ DE NANTES   (France)

Author keywords

Carbon; Nanocomposite; PECVD; Sputtering; Thin films; Titanium

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; CARBON; CARBON FILMS; CHEMICAL VAPOR DEPOSITION; ION BOMBARDMENT; MAGNETRON SPUTTERING; MICROSTRUCTURE; NANOCOMPOSITE FILMS; NANOCOMPOSITES; NANOCRYSTALLITES; NANOCRYSTALS; PHYSICAL VAPOR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SPUTTERING; TITANIUM; TITANIUM CARBIDE; TITANIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

CRYSTALLINE ORIENTATIONS; EVOLUTION OF THE MICROSTRUCTURE; FILM CHARACTERIZATIONS; FOUR-PROBE METHODS; IONIZED PHYSICAL VAPOR DEPOSITION; TIC/A-C:H NANOCOMPOSITES; TITANIUM CONTAINING; TITANIUM TARGETS;

THIN FILMS;

EID: 76349103042     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.09.045     Document Type: Article

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