Fabrication, characterization and loss analysis of silicon nanowaveguides

Journal of Lightwave Technology

Volumn 32, Issue 13, 2014, Pages 2303-2307

  Qiu, Chao ^a,b   Sheng, Zhen ^a   Li, Hao ^a   Liu, Wei ^c   Li, Le ^b   Pang, Albert ^b   Wu, Aimin ^a   Wang, Xi ^a   Zou, Shichang ^a,b   Gan, Fuwan ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b SEMICONDUCTOR MANUFACTURING INTERNATIONAL CORPORATION   (China)

^c Engineering Division i Huali Microelectronics Corporation   (China)

Author keywords

Loss analysis; silicon photonics; silicon on insulator (SOI); waveguide

Indexed keywords

FABRICATION; OPTICAL WAVEGUIDES; PHOTOLITHOGRAPHY; PHOTONIC DEVICES; PHOTONICS; SILICON; SILICON ON INSULATOR TECHNOLOGY; WAVEGUIDES;

COMPLEMENTARY METAL-OXIDE-SEMICONDUCTOR TECHNOLOGIES; LOSS ANALYSIS; PHOTONIC INTEGRATED CIRCUITS; SILICON NANOWAVEGUIDES; SILICON ON INSULATOR WAFERS; SILICON PHOTONICS; SILICON-ON-INSULATORS; TOTAL PROPAGATION LOSS;

SILICON WAFERS;

EID: 84903288617     PISSN: 07338724     EISSN: None     Source Type: Journal    
DOI: 10.1109/JLT.2014.2309122     Document Type: Article

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